Ultradeep Fused Silica Glass Etching With an HF-resistant Photosensitive Resist for Optical Imaging Applications
Journal of Micromechanics and Microengineering - United Kingdom
doi 10.1088/0960-1317/22/3/035011
Full Text
Open PDFAbstract
Available in full text
Categories
Date
February 14, 2012
Authors
Publisher
IOP Publishing