Amanote Research
Register
Sign In
Anticorrosion Behaviour of Amorphous Silicon-Based Coatings Prepared by Remote Cold Plasma-Assisted Chemical Vapour Deposition Process
New Trends and Issues Proceedings on Advances in Pure and Applied Sciences
doi 10.18844/gjapas.v0i9.3013
Full Text
Open PDF
Abstract
Available in
full text
Date
January 9, 2018
Authors
A. Delimi
Publisher
Birlesik Dunya Yenilik Arastirma ve Yayincilik Merkezi
Related search
Plasma Enhanced Chemical Vapour Deposition of Hydrogenated Amorphous Silicon at Atmospheric Pressure
Plasma Sources Science and Technology
Condensed Matter Physics
Silicon Carbon Nitride Thin Films Deposited by Pulsed Microwave Plasma Assisted Chemical Vapour Deposition
Journal of Applied Sciences
Plasma Enhanced-Chemical Vapour Deposition of Scuff-Resistant Hydrogenated Amorphous Carbon Coatings on C100 Steel
Journal of Surface Engineered Materials and Advanced Technology
High Temperature Fretting Behaviour of Plasma Vapour Deposition TiN Coatings
Surface and Coatings Technology
Surfaces
Condensed Matter Physics
Interfaces
Materials Chemistry
Films
Coatings
Chemistry
Gallium Assisted Plasma Enhanced Chemical Vapor Deposition of Silicon Nanowires
Nanotechnology
Mechanics of Materials
Electronic Engineering
Mechanical Engineering
Materials Science
Nanoscience
Electrical
Bioengineering
Nanotechnology
Chemistry
Copper-Assisted Direct Growth of Vertical Graphene Nanosheets on Glass Substrates by Low-Temperature Plasma-Enhanced Chemical Vapour Deposition Process
Laser-Induced Chemical Vapour Deposition of Silicon Carbonitride
Le Journal de Physique IV
Physical and Electrical Properties of Noncrystalline Al2O3 Prepared by Remote Plasma Enhanced Chemical Vapor Deposition
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surfaces
Films
Interfaces
Condensed Matter Physics
Coatings
Microdoping Compensation of Microcrystalline Silicon Obtained by Hot-Wire Chemical Vapour Deposition
Fuel and Energy Abstracts