Amanote Research
Register
Sign In
Geometry of Chemical Beam Vapor Deposition System for Efficient Combinatorial Investigations of Thin Oxide Films: Deposited Film Properties Versus Precursor Flow Simulations
doi 10.1021/acscombsci.5b00146.s001
Full Text
Open PDF
Abstract
Available in
full text
Date
Unknown
Authors
Unknown
Publisher
American Chemical Society (ACS)
Related search
Organometallic Chemical Vapor Deposition of Copper Oxide Thin Films
Deposition and Properties of Zn3N2 Thin Films by Atmospheric Pressure Chemical Vapor Deposition
Transactions of the Materials Research Society of Japan
Tribological Properties of Nanocrystalline Diamond Films Deposited by Hot Filament Chemical Vapor Deposition
AIP Advances
Nanotechnology
Astronomy
Physics
Nanoscience
Electrochromic and Colorimetric Properties of Nickel(II) Oxide Thin Films Prepared by Aerosol-Assisted Chemical Vapor Deposition
ACS Applied Materials & Interfaces
Medicine
Materials Science
Nanotechnology
Nanoscience
Hexafluoroacetylacetonate Cu Vinylcyclohexane as a Liquid Precursor for Low-Temperature Chemical Vapor Deposition of Copper Thin Films
Electrochemical and Solid-State Letters
High Temperature Dielectric Properties of (BxNyOz) Thin Films Deposited Using Ion Source Assisted Physical Vapor Deposition
Journal of Advanced Dielectrics
Electronic Engineering
Condensed Matter Physics
Optical
Electrical
Magnetic Materials
Composites
Electronic
Ceramics
Mechanical Properties of B(C,N) Thin Film by Plasma-Assisted Chemical Vapor Deposition.
SHINKU
Metal-Organic Chemical Vapour Deposition of Lithium Manganese Oxide Thin Films via Single Solid Source Precursor
Materials Science-Poland
Mechanics of Materials
Materials Science
Condensed Matter Physics
Mechanical Engineering
Electrical Properties of (Ba,Sr)TiO3 Thin Films Revisited: The Case of Chemical Vapor Deposited Films on Pt Electrodes
Journal of Applied Physics
Astronomy
Physics