Erratum: ‘‘Elimination of Slips on Silicon Wafer Edge in Rapid Thermal Process by Using a Ring Oxide’’ [J. Appl. Phys. 67, 7583 (1990)]

Journal of Applied Physics - United States
doi 10.1063/1.347206
Full Text
Abstract

Available in full text

Date
Authors
Publisher

AIP Publishing

Related search

Erratum: Subdomain Zinc Ferrite Particles: Synthesis and Characterization [J. Appl. Phys. 67, 5509 (1990)]

Journal of Applied Physics
AstronomyPhysics
1992English

Erratum: Superconducting Magnetometer [Appl. Phys. Lett. 56, 2037 (1990)]

Applied Physics Letters
AstronomyPhysics
1990English

Erratum: Measurement of Electron Mobility in Epitaxial Heavily Phosphorus‐doped Silicon [J. Appl. Phys. 56, 2250 (1984)]

Journal of Applied Physics
AstronomyPhysics
1985English

Erratum: “Cleaning Graphene Using Atomic Force Microscope” [J. Appl. Phys. 111, 064904 (2012)]

Journal of Applied Physics
AstronomyPhysics
2012English

Thermal Uniformity of 12-In Silicon Wafer During Rapid Thermal Processing by Inverse Heat Transfer Method

IEEE Transactions on Semiconductor Manufacturing
Electronic EngineeringIndustrialCondensed Matter PhysicsManufacturing EngineeringOpticalElectricalMagnetic MaterialsElectronic
2000English

Comment on ‘‘Effects of Electron Cyclotron Resonance Plasma Thermal Oxidation on the Properties of Polycrystalline Silicon Film’’ [Appl. Phys. Lett. 67, 1880 (1995)]

Applied Physics Letters
AstronomyPhysics
1996English

Erratum: ‘‘A Novel Superlattice Infrared Source’’ [J. Appl. Phys. 63, 2856 (1988)]

Journal of Applied Physics
AstronomyPhysics
1991English

Comment on “A General Property of Endoreversible Thermal Engines” [J. Appl. Phys. 81, 2973 (1997)]

Journal of Applied Physics
AstronomyPhysics
2001English

Dicing Process for Thin Silicon Wafer by Using Femtosecond-Laser

Journal of the Japan Society for Precision Engineering, Contributed Papers
2004English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2024 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy