Initial Oxidation Kinetics of Copper Films Investigated by In-Situ Uhv-Tem

Microscopy and Microanalysis - United Kingdom
doi 10.1017/s143192760210314x
Full Text
Abstract

Available in full text

Categories
Instrumentation
Date
Authors
Publisher

Cambridge University Press (CUP)

Related search

Initial Oxidation Kinetics of Cu(100), (110), and (111) Thin Films Investigated by in Situ Ultra-High-Vacuum Transmission Electron Microscopy

Journal of Materials Research
Mechanics of MaterialsMaterials ScienceCondensed Matter PhysicsMechanical Engineering
2005English

Nano-Oxide Formation by in Situ Oxidation of Copper Thin Films

Microscopy and Microanalysis
Instrumentation
2003English

Improvements of UHV Copper Gaskets

Journal of Vacuum Science and Technology
Engineering
1968English

Thickness-Dependent Flat Band Potential of Anatase TiO2(001) Epitaxial Films on Nb:SrTiO3(001) Investigated by UHV-Electrochemistry Approach

English

Incipient Plasticity in Thin Films: An In-Situ TEM Indentation Study

Microscopy and Microanalysis
Instrumentation
2006English

Solid State Kinetics of the Oxidation of MoO2 Investigated by Time-Resolved X-Ray Absorption Spectroscopy

Solid State Communications
Materials ChemistryChemistryCondensed Matter Physics
2001English

In Situ LC-TEM Studies of Corrosion of Metal Thin Films in Aqueous Solutions

Microscopy and Microanalysis
Instrumentation
2015English

Hot Workability of 300M Steel Investigated by in Situ and Ex Situ Compression Tests

Metals
Materials Science
2019English

Processing of PbTiO3 Thin Films. I. In Situ Investigation of Formation Kinetics

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
SurfacesFilmsInterfacesCondensed Matter PhysicsCoatings
1996English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2024 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy