Properties of Corona Charged Plasma Vapour Deposited PTFE Film

Journal of Electrostatics - Netherlands
doi 10.1016/s0304-3886(97)00059-4
Full Text
Abstract

Available in full text

Date
Authors
Publisher

Elsevier BV

Related search

The Magnetic Properties of Vapor-Deposited Co Film

SHINKU
1981English

The Behavior of Corona Ions in Corona-Charged Electrophotographic Sensors

Journal of the Japan Society of Colour Material
1972English

Silicon Carbon Nitride Thin Films Deposited by Pulsed Microwave Plasma Assisted Chemical Vapour Deposition

Journal of Applied Sciences
2017English

Pulsed Corona Plasma Source Characterization for Film Deposition on the Inner Surface of Tubes

Journal of Physics D: Applied Physics
SurfacesUltrasonicsCondensed Matter PhysicsAcousticsOpticalMagnetic MaterialsFilmsCoatingsElectronic
2010English

Properties of Silicon Dioxide Film Deposited by PECVD at Low Temperature/Pressure

Metallurgical and Materials Engineering
AlloysMetalsMechanical Engineering
2014English

Structural and Magnetic Properties of Ultra-Thin Fe Films on Metal-Organic Chemical Vapour Deposited GaN(0001)

Journal of Applied Physics
AstronomyPhysics
2017English

The Electrical Properties of Plasma-Deposited Thin Films Derived From Pelargonium Graveolens

Electronics (Switzerland)
ControlElectronic EngineeringSignal ProcessingComputer NetworksSystems EngineeringHardwareCommunicationsElectricalArchitecture
2017English

Structure and Properties of Ni22Cr10Al1Y Coatings Deposited by the Vacuum Plasma Spray Process

Vojnotehnicki glasnik
2017English

Microstructure and Properties of NiCrBSiC Overlay Coatings Deposited by the Plasma Scanning Process

2014English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2024 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy