Poly (.ALPHA.-methyl-p-hydroxystyrene-co-methacrylonitrile) Based Single-Layer Resists for VUV Lithography: (2) F2 Excimer Laser Exposure Characteristics.
Journal of Photopolymer Science and Technology - Japan
doi 10.2494/photopolymer.13.467
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Date
January 1, 2000
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Technical Association of Photopolymers, Japan