Amanote Research
Register
Sign In
A High-Throughput Contact-Hole Resolution Metric for Photoresists: Full-Process Sensitivity Study
doi 10.1117/12.768551
Full Text
Open PDF
Abstract
Available in
full text
Date
March 14, 2008
Authors
Christopher N. Anderson
Patrick P. Naulleau
Publisher
SPIE
Related search
mQC: A Heuristic Quality-Control Metric for High-Throughput Drug Combination Screening
Scientific Reports
Multidisciplinary
A New Sol-Gel Process for Fabricating TiO2 Photoresists
SPIE Newsroom
High-Throughput Super-Resolution Microscopy for Revealing Molecular Architecture
Biophysical Journal
Biophysics
High Throughput Analysis Enables High Throughput Experimentation in Pharmaceutical Process Research
Reaction Chemistry and Engineering
Fluid Flow
Process Chemistry
Chemical Engineering
Transfer Processes
Catalysis
Chemistry
Technology
Contact Hole Shrink Process Using Graphoepitaxial Directed Self-Assembly Lithography
Journal of Micro/ Nanolithography, MEMS, and MOEMS
Electronic Engineering
Condensed Matter Physics
Mechanical Engineering
Electronic
Molecular Physics,
Nanoscience
Optical
Electrical
Atomic
Magnetic Materials
Nanotechnology
Optics
Massive Black Hole Recoil in High Resolution Hosts
Astronomische Nachrichten
Astrophysics
Astronomy
Planetary Science
Space
Epicardial Ventricular Tachycardia Ablation Guided by a Novel High‐Resolution Contact Mapping System: A Multicenter Study
Journal of the American Heart Association
Cardiovascular Medicine
Cardiology
The Potential of Ion Mobility Mass Spectrometry for High-Throughput and High-Resolution Lipidomics
Current Opinion in Chemical Biology
Biochemistry
Analytical Chemistry
High Resolution Melting (HRM) for High-Throughput Genotyping—Limitations and Caveats in Practical Case Studies
International Journal of Molecular Sciences
Organic Chemistry
Molecular Biology
Theoretical Chemistry
Inorganic Chemistry
Computer Science Applications
Spectroscopy
Medicine
Catalysis
Physical
