Microwave Plasma-Activated Chemical Vapor Deposition of Nitrogen-Doped Diamond. II: CH4/N2/H2 Plasmas

Journal of Physical Chemistry A - United States
doi 10.1021/acs.jpca.6b09009
Full Text
Abstract

Available in full text

Date
Authors
Publisher

American Chemical Society (ACS)

Related search

Synthesis and Mechanical Wear Studies of Ultra Smooth Nanostructured Diamond (USND) Coatings Deposited by Microwave Plasma Chemical Vapor Deposition With He/H2/Ch4/N2 Mixtures

Diamond and Related Materials
Electronic EngineeringAstronomyMechanical EngineeringPhysicsMaterials ChemistryOpticalElectricalMagnetic MaterialsChemistryElectronic
2008English

Deposition of Nanocrystalline Diamond Films on Pure Ti by CH4/H2 Microwave Plasma CVD

Zairyo/Journal of the Society of Materials Science, Japan
Mechanics of MaterialsMaterials ScienceCondensed Matter PhysicsMechanical Engineering
2005English

Optical Emission Diagnostics of H2+CH4 50‐Hz–13.56‐MHz Plasmas for Chemical Vapor Deposition

Journal of Applied Physics
AstronomyPhysics
1991English

Diamond Film Grown by Microwave Plasma-Assisted Vapor Deposition.

Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering
Mechanical Engineering
1987English

Radio‐frequency Plasma Chemical Vapor Deposition Growth of Diamond

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
SurfacesFilmsInterfacesCondensed Matter PhysicsCoatings
1989English

Spatial Distribution of Plasma Parameters in Microwave Plasma Chemical Vapor Deposition

IEEJ Transactions on Fundamentals and Materials
Electronic EngineeringElectrical
1992English

Detailed Study of the Plasma-Activated Catalytic Generation of Ammonia in N2-H2 Plasmas

Journal of Applied Physics
AstronomyPhysics
2007English

Plasma-Enhanced Chemical Vapor Deposition of Boron Nitride Thin Films From B2H6–H2–NH3 and B2H6–N2 Gas Mixtures

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
SurfacesFilmsInterfacesCondensed Matter PhysicsCoatings
1998English

Growth of Diamond Thin Films by Electron Assisted and DC Plasma Chemical Vapor Deposition.

Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering
Mechanical Engineering
1987English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2025 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy