Carbon Nitride Thin Films Prepared by a Capacitively Coupled RF Plasma Jet

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms - Netherlands
doi 10.1016/s0168-583x(96)00531-9
Full Text
Abstract

Available in full text

Date
Authors
Publisher

Elsevier BV

Related search

Structure of Indium Nitride Thin Films Prepared by RF-magnetron Sputtering

Acta Crystallographica Section A Foundations of Crystallography
1996English

Characteristics of Diamond-Like Carbon Thin Films Prepared by a RF Plasma Pulse Deposition Method

TANSO
1996English

A Brief Overview of RF Sputtering Deposition of Boron Carbon Nitride (BCN) Thin Films

Emergent Materials
2018English

Silicon Carbon Nitride Thin Films Deposited by Pulsed Microwave Plasma Assisted Chemical Vapour Deposition

Journal of Applied Sciences
2017English

Thermoelectric Properties of Zn0.98Al0.02O Thin Films Prepared by RF Magnetron Sputtering

Journal of the Ceramic Society of Japan
Materials ChemistryChemistryCondensed Matter PhysicsCompositesCeramics
2004English

Breakdown Mechanism of Capacitively Coupled RF Discharges

IEEJ Transactions on Fundamentals and Materials
Electronic EngineeringElectrical
1998English

X-Ray Photoelectron Spectroscopy and Raman Spectroscopy Studies on Thin Carbon Nitride Films Deposited by Reactive RF Magnetron Sputtering

World Journal of Nano Science and Engineering
2012English

Hydrogen Influence on Gallium Arsenide Thin Films Prepared by Rf-Magnetron Sputtering Technique

Brazilian Journal of Physics
AstronomyPhysics
2006English

A Deposition Model of Ultra Thin Plasma Polymerized Acethylene Films by Pulsed RF Discharge

IEEJ Transactions on Fundamentals and Materials
Electronic EngineeringElectrical
1996English

Amanote Research

Note-taking for researchers

Follow Amanote

© 2024 Amaplex Software S.P.R.L. All rights reserved.

Privacy PolicyRefund Policy