Amanote Research
Register
Sign In
On the Nature of Dielectric Breakdown in Ultra-Thin Langmuir Films
ElectroComponent Science and Technology
doi 10.1155/apec.3.117
Full Text
Open PDF
Abstract
Available in
full text
Date
January 1, 1976
Authors
V. K. Srivastava
Publisher
Hindawi Limited
Related search
Dielectric Properties of Ultra-Thin Semiconducting Films
Hyomen Kagaku
Ultra-Thin Silicate Films on Metals
Journal of Physics Condensed Matter
Materials Science
Condensed Matter Physics
Ultra-Thin Semiconductor Films.
Nihon Kessho Gakkaishi
Electrostatic Properties of Ultra-Thin Polyimide Langmuir-Blodgett Films Biased Under a Needle-Plane Electrode System
IEEJ Transactions on Fundamentals and Materials
Electronic Engineering
Electrical
Dielectric Dynamics of Epitaxial BiFeO3 Thin Films
AIP Advances
Nanotechnology
Astronomy
Physics
Nanoscience
On the Nature of the Interfacial Layer in Ultra-Thin TiN/LaLuO3 Gate Stacks
Journal of Applied Physics
Astronomy
Physics
Study of Electronic Transport and Breakdown in Thin Insulating Films
Constraint Effects on Cohesive Failures in Low-K Dielectric Thin Films
Materials Research Society Symposium - Proceedings
Mechanics of Materials
Materials Science
Condensed Matter Physics
Mechanical Engineering
Characterization of Ultra-Thin Carbon Film Prepared From Polyimide Langmuir-Blodgett Film
TANSO
