Effect of PVD Process Parameters on the Quality and Reliability of Thin (10–30 Nm) Al2O3 Dielectrics
Applied Nanoscience (Switzerland) - Switzerland
doi 10.1007/s13204-011-0033-0
Full Text
Open PDFAbstract
Available in full text
Categories
Date
September 29, 2011
Authors
Publisher
Springer Science and Business Media LLC