Incorporation of N in the TiO2 Lattice Versus Oxidation of TiN: Influence of the Deposition Method on the Energy Gap of N-Doped TiO2 Deposited by Reactive Magnetron Sputtering
Materials Research - Brazil
doi 10.1590/1980-5373-mr-2016-0303
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Date
March 2, 2017
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FapUNIFESP (SciELO)