(PDF) Modifying the Microstructure and Morphology of Film

Modifying the Microstructure and Morphology of Film Surface Layers by Manipulating Chemical Vapor Deposition Reactor Conditions

Journal of Applied Physics - United States

doi 10.1063/1.1360216

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Date

May 1, 2001

Authors

D. J. Srolovitz

Publisher

AIP Publishing

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