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Ultrathin GeOx Interfacial Repairer Formed by Thermal Oxidation for Germanium MOS Devices
doi 10.7567/ssdm.2013.ps-1-10
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Date
January 1, 2013
Authors
L. Han
S.K. Wang
B.Q. Xue
X. Zhang
W.R. Wu
H.D. Chang
W. Zhao
B. Sun
Y. Zhao
H.G. Liu
Y.P. Cui
Publisher
The Japan Society of Applied Physics
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