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Progress in EUV Resists Towards High-Na EUV Lithography
doi 10.1117/12.2516260
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Date
May 29, 2019
Authors
Xiaolong Wang
Zuhal Tasdemir
Iacopo Mochi
Michaela Vockenhuber
Lidia van Lent-Protasova
Marieke Meeuwissen
Rolf Custers
Gijsbert Rispens
Rik Hoefnagels
Yasin Ekinci
Publisher
SPIE
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