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Publications by A. Feingold
The Influence of Ammonia on Rapid‐thermal Low‐pressure Metalorganic Chemical Vapor Deposited TiNxfilms From Tetrakis (Dimethylamido) Titanium Precursor Onto InP
Journal of Applied Physics
Astronomy
Physics
Related publications
Atmospheric Pressure Chemical Vapor Deposition of TiN From Tetrakis(dimethylamido)titanium and Ammonia
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Thermal Expansion of Low-Pressure Chemical Vapor Deposition Polysilicon Films
Journal of Materials Research
Mechanics of Materials
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Condensed Matter Physics
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Magnetic Properties of Semiconducting Spinel CdCr2S4 Nanostructured Films Grown by Low-Pressure MetalOrganic Chemical Vapor Deposition
Influence of Ammonia Concentration on the Microstructure, Electrical and Raman Properties of Low Temperature Chemical Bath Deposited ZnO Nanorods
Materials Science in Semiconductor Processing
Mechanics of Materials
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Condensed Matter Physics
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Low Pressure Chemical Vapor Deposition of A-Si:H From Disilane
Enhanced Optical Properties of Chemical Vapor Deposited Single Crystal Diamond by Low-Pressure/High-Temperature Annealing
Proceedings of the National Academy of Sciences of the United States of America
Multidisciplinary
Cation Source Dependence of $\Bf Ga_{0.5}In_{0.5}P$ Growth Rate by Low-Pressure Metalorganic Chemical Vapor Deposition
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
Engineering
Astronomy
Physics
Stabilizing the Wettability of Initiated Chemical Vapor Deposited (iCVD) Polydivinylbenzene Thin Films by Thermal Annealing
Advanced Materials Interfaces
Mechanics of Materials
Mechanical Engineering
Chemical Vapor Deposition of Polycrystalline Silicon in a Rapid Thermal Processor
Materials Research Society Symposium - Proceedings
Mechanics of Materials
Materials Science
Condensed Matter Physics
Mechanical Engineering
