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Publications by A.K. Ray-Chaudhuri

Development of Compact Extreme Ultraviolet Interferometry for On-Line Test of Lithography Cameras

English

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Pushing Extreme Ultraviolet Lithography Development Beyond 22 Nm Half Pitch

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Power Scaling of an Extreme Ultraviolet Light Source for Future Lithography

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Experimental Investigation of Beryllium-Based Multilayer Coatings for Extreme Ultraviolet Lithography

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Intense Plasma Discharge Source at 135 Nm for Extreme-Ultraviolet Lithography

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Computational Study of Pattern Formation for Chemically Amplified Resists in Extreme Ultraviolet Lithography

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Enhancing Extreme Ultraviolet Photons Emission in Laser Produced Plasmas for Advanced Lithography

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Spectroscopic Study of Debris Mitigation With Minimum-Mass Sn Laser Plasma for Extreme Ultraviolet Lithography

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