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Publications by Akimori TABATA
Structure and Electrical Properties of Hydrogenated Amorphous Silicon Carbide Prepared by Plasma CVD Method.
Journal of Society of Materials Engineering for Resources of Japan
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Impact of Dilution Gases on Structure, Properties and Growth of Hydrogenated Nanocrystalline Silicon (Nc-Si:H) Prepared by HW-CVD Method
International Journal of Thin Film Science and Technology
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Optical Properties of Hydrogenated Amorphous Silicon
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A Study of Electronic Defects in Hydrogenated Amorphous Silicon Prepared by the Expanding Thermal Plasma Technique
Materials Research Society Symposium - Proceedings
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Hydrogenated Silicon Carbide Thin Films Prepared With High Deposition Rate by Hot Wire Chemical Vapor Deposition Method
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Structural and Electrical Properties of Silicon Nitride Films Prepared by Multipolar Plasma‐enhanced Deposition
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Top-Gate Amorphous-Silicon Thin-Film Transistors Produced by CVD Method
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
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Optical and Electrical Properties of Amorphous SiC:H Prepared by Magnetron Sputtering.
SHINKU
Excellent Silicon Surface Passivation Achieved by Industrial Inductively Coupled Plasma Deposited Hydrogenated Intrinsic Amorphous Silicon Suboxide
International Journal of Photoenergy
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the Environment
Nonlinear Transmission Properties of Hydrogenated Amorphous Silicon Core Optical Fibers
Optics Express
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