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Publications by Akira Tanihara
Preparation of TiN Films by ECR Plasma CVD
Related publications
Current Technology of ECR Plasma CVD.
Journal of the Surface Finishing Society of Japan
Effect of N2 Flow Rate on TiN Films Formed by DC Plasma CVD
Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals
Mechanics of Materials
Alloys
Materials Chemistry
Condensed Matter Physics
Metals
Preparation and Magnetic Properties of FexN From Plasma Generated by ECR Discharge.
Journal of the Magnetics Society of Japan
Special Issue. Preparation of High Tc Superconducting Film. Preparation of Superconducting Thin Films by CVD.
Journal of the Surface Finishing Society of Japan
Diamond Films Synthesized by DC Plasma CVD With a Diamond Cathode.
Journal of the Surface Finishing Society of Japan
Properties of the B-Si-N Ceramic Thin Films by Plasma-Cvd.
SHINKU
Erratum to : Comparison of Properties of TiN Films Deposited by Different Plasma Coating
Shinku
Deposition of Nanocrystalline Diamond Films on Pure Ti by CH4/H2 Microwave Plasma CVD
Zairyo/Journal of the Society of Materials Science, Japan
Mechanics of Materials
Materials Science
Condensed Matter Physics
Mechanical Engineering
Synthesis of TiO2 Films by Laser CVD
Journal of the Ceramic Society of Japan
