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Publications by Anak Agung Ngurah Made Narottama
Modelling of Phosphorus and Boron Doping Concentration on SOI Wafer Based Diffusion Process
Logic: Jurnal Rancang Bangun dan Teknologi
Related publications
Diffusion of Phosphorus and Boron From ALD Oxides Into Silicon
Physica Status Solidi (A) Applications and Materials Science
Surfaces
Electronic Engineering
Condensed Matter Physics
Materials Chemistry
Optical
Electrical
Magnetic Materials
Films
Coatings
Electronic
Interfaces
A Semi-Empirical Hamiltonian for Boron, Phosphorus and Compounds Containing Boron, Phosphorus and Silicon.
5-Axis Motion Sensor Using SOI Wafer and the Design Method
IEEJ Transactions on Sensors and Micromachines
Electronic Engineering
Electrical
Mechanical Engineering
Effects of Various Pre-Intrinsic and Phosphorus Diffusion Gettering Treatments Upon Quality of Czochralski Silicon Wafer Surface During a Simulated 4 Megabit Dynamic Random Access Memory Process
Journal of the Electrochemical Society
Surfaces
Condensed Matter Physics
Optical
Electrochemistry
Sustainability
Materials Chemistry
Magnetic Materials
Renewable Energy
Films
Coatings
Electronic
the Environment
Boron-Enhanced Diffusion of Boron From Ultralow-Energy Boron Implantation
Boron and Nitrogen Doping in Graphene Antidot Lattices
Physical Review B
Optical
Electronic
Condensed Matter Physics
Magnetic Materials
Dependence of Thermal Conductivity of Silicone-Based Composite on Volume Concentration of Boron Nitride
Izvestiâ vysših učebnyh zavedenij. Priborostroenie
Effect of Boron and Farmyard Manure Application on Boron Concentration and Dry Matter Yield of Paddy
International Journal of Chemical Studies
A Study on High Temperature CMOS Circuits for Sensor Applications With SDB-SOI Wafer.
IEEJ Transactions on Sensors and Micromachines
Electronic Engineering
Electrical
Mechanical Engineering
