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Publications by B. Heskamp

Recent Advancements in 193 Nm Step and Scan Lithography.

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
1999English

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Phase-Shift Mask Issues for 193-Nm Lithography

1994English

Integration of Directed Self-Assembly With 193 Nm Lithography

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2010English

Approaching the Numerical Aperture of Water Immersion Lithography at 193-Nm

2004English

Hyper High Numerical Aperature Achromatic Interferometer for Immersion Lithography at 193 Nm

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
2005English

Low Loss InP Membrane Photonic Integrated Circuits Enabled by 193-Nm Deep UV Lithography

2019English

High-Q Photonic Crystal Nanocavities on 300 Mm SOI Substrate Fabricated With 193 Nm Immersion Lithography

Journal of Lightwave Technology
OpticsAtomicMolecular Physics,
2014English

Photodissociation of Isobutene at 193 Nm

Physical Chemistry Chemical Physics
Theoretical ChemistryAstronomyPhysicsPhysical
2012English

Recent Advancements in Digital Forensics

IEEE Security and Privacy
Computer NetworksElectronic EngineeringLawElectricalCommunications
2017English

Recent Advancements in Ullmann Reaction

Yuki Gosei Kagaku Kyokaishi/Journal of Synthetic Organic Chemistry
Organic Chemistry
2011English

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