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Publications by Byoung‐Youp Kim
Microstructure and Deposition Rate of Aluminum Thin Films From Chemical Vapor Deposition With Dimethylethylamine Alane
Applied Physics Letters
Astronomy
Physics
Related publications
Hydrogenated Silicon Carbide Thin Films Prepared With High Deposition Rate by Hot Wire Chemical Vapor Deposition Method
Journal of Coatings
Deposition and Properties of Zn3N2 Thin Films by Atmospheric Pressure Chemical Vapor Deposition
Transactions of the Materials Research Society of Japan
Organometallic Chemical Vapor Deposition of Copper Oxide Thin Films
Chemical Vapor Deposition of Copper Thin Films With (Hexafluoroacetylacetonate)Cu(allyltrimethylsilane)
Electrochemical and Solid-State Letters
Surface-Inhibiting Effect in Chemical Vapor Deposition of BoronCarbon Thin Films From Trimethylboron
Localized Microreactor Deposition of Thin Films and Nanostructures as New Approach to Investigation of Chemical Vapor Deposition
Nanoindustry Russia
Chemical Vapor Deposition of Azidoalkylsilane Monolayer Films
Proton Conductivity of Columnar Ceria Thin-Films Grown by Chemical Vapor Deposition
Physical Chemistry Chemical Physics
Theoretical Chemistry
Astronomy
Physics
Physical
Chemical Bath Deposition of In2S3 Thin Films
European Reviews of Chemical Research
