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Publications by C.R. Harwoo
Rapid Characterization and Modeling of Pattern-Dependent Variation in Chemical-Mechanical Polishing
IEEE Transactions on Semiconductor Manufacturing
Electronic Engineering
Industrial
Condensed Matter Physics
Manufacturing Engineering
Optical
Electrical
Magnetic Materials
Electronic
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Grinding and Abrasion-Part II. Chemical Mechanical Polishing of Silicon Wafers.
SHINKU
Study of Chemical Etching and Chemo-Mechanical Polishing on CdZnTe Nuclear Detectors
Journal of Materials Science and Chemical Engineering
A Contact-Mechanics Based Model for Dishing and Erosion in Chemical-Mechanical Polishing
Materials Research Society Symposium - Proceedings
Mechanics of Materials
Materials Science
Condensed Matter Physics
Mechanical Engineering
A Novel Approach of Chemical Mechanical Polishing for Cadmium Zinc Telluride Wafers
Scientific Reports
Multidisciplinary
Axiomatic Design of a Chemical Mechanical Polishing (CMP) Wafer Carrier With Zoned Pressure Control
The Impact of Chemical Mechanical Planarization Polishing on a Surface Textured With Deterministic Microasperities
A Novel Approach of Chemical Mechanical Polishing Using Environment-Friendly Slurry for Mercury Cadmium Telluride Semiconductors
Scientific Reports
Multidisciplinary
Mechanical Characterization of Gres Porcelain and Low-Velocity Impact Numerical Modeling
Materials
Materials Science
Condensed Matter Physics
Novel Chemical Mechanical Polishing/Plasma-Chemical Vaporization Machining (CMP/P-CVM) Combined Processing of Hard-To-Process Crystals Based on Innovative Concepts
Sensors and Materials
Materials Science
Instrumentation
