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Publications by Camille Petit-Etienne

Erratum: “Two-Step Cycling Process Alternating Implantation and Remote Plasma Etching for Topographically Selective Etching: Application to Si3N4 Spacer Etching” [J. Appl. Phys. 126, 243301 (2019)]

Journal of Applied Physics
AstronomyPhysics
2020English

Low Damage Patterning of In0.53Ga0.47As Film for Its Integration as N-Channel in a Fin Metal Oxide Semiconductor Field Effect Transistor Architecture

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
SurfacesFilmsInterfacesCondensed Matter PhysicsCoatings
2018English

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