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Publications by Chad Garretson
A Novel Retaining Ring in Advanced Polishing Head Design for Significantly Improved CMP Performance
Materials Research Society Symposium - Proceedings
Mechanics of Materials
Materials Science
Condensed Matter Physics
Mechanical Engineering
Related publications
Studies on Slurry Design Fundamentals for Advanced CMP Applications
ECS Transactions
Engineering
Axiomatic Design of a Chemical Mechanical Polishing (CMP) Wafer Carrier With Zoned Pressure Control
A Novel Extracellular Drug Conjugate Significantly Inhibits Head and Neck Squamous Cell Carcinoma
Oral Oncology
Cancer Research
Oral Surgery
Oncology
Advanced Manufacturing for Novel Materials in Industrial Design Applications
American Journal of Engineering and Applied Sciences
Geotechnical Engineering
Energy Engineering
Engineering Geology
Engineering
Chemical Engineering
Power Technology
Environmental Engineering
Computer Science
Theory, Design and Performance of a Ring Circulator
A Novel Application of Photogrammetry for Retaining Wall Assessment
Infrastructures
Building
Geotechnical Engineering
Materials Science
Civil
Structural Engineering
Computer Science Applications
Construction
Engineering Geology
Design and Control of a Parallel Robot for Mold Polishing
MATEC Web of Conferences
Materials Science
Engineering
Chemistry
Novel Chemical Mechanical Polishing/Plasma-Chemical Vaporization Machining (CMP/P-CVM) Combined Processing of Hard-To-Process Crystals Based on Innovative Concepts
Sensors and Materials
Materials Science
Instrumentation
Integration of CMP Fixed Abrasive Polishing Into the Manufacturing of Thick Film SOI Substrates
Materials Research Society Symposium - Proceedings
Mechanics of Materials
Materials Science
Condensed Matter Physics
Mechanical Engineering
