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Publications by Cheng-Li Lin
Effects of TaN Substrate Pretreatment by Ar Plasma on Copper Chemical Vapor Deposition
Journal of the Electrochemical Society
Surfaces
Condensed Matter Physics
Optical
Electrochemistry
Sustainability
Materials Chemistry
Magnetic Materials
Renewable Energy
Films
Coatings
Electronic
the Environment
Effects of the Underlayer Substrates on Copper Chemical Vapor Deposition
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
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Synthesis of Graphene by Magnetron-Plasma-Enhanced Chemical Vapor Deposition on Different Substrate Materials
Journal of the Vacuum Society of Japan
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Instrumentation
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Materials Science
Substrate Effect on Plasma Clean Efficiency in Plasma Enhanced Chemical Vapor Deposition System
Active and Passive Electronic Components
Electronic Engineering
Optical
Electrical
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Deposition of Titanium Nitride on Porous Glass by Plasma-Enhanced Chemical Vapor Deposition.
SHINKU
Improvement of Electrical Device Performances for Graphene Directly Grown on a SiO2 Substrate by Plasma Chemical Vapor Deposition
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Thermal Plasma Chemical Vapor Deposition of SiC.
ISIJ International
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Alloys
Materials Chemistry
Metals
Mechanical Engineering
Chemical Vapor Deposition of Diamond on Si Substrate Treated by Using Fluidized Bed.
Kagaku Kogaku Ronbunshu
Chemistry
Chemical Engineering
Effects of Hydrogen Sulfide on the Plasma-Assisted Chemical Vapor Deposition of Carbon Nanotubes.
Hyomen Kagaku
Simultaneous Synthesis of Nanodiamonds and Graphene via Plasma Enhanced Chemical Vapor Deposition (MW PE-CVD) on Copper
SpringerPlus
Multidisciplinary
