Amanote Research
Register
Sign In
Discover open access scientific publications
Search, annotate, share and cite publications
Publications by Christian A. Ringhofer
An Asymptotic Analysis for a Model of Chemical Vapor Deposition on a Microstructured Surface
SIAM Journal on Applied Mathematics
Applied Mathematics
Related publications
Chemical Vapor Deposition Model of Polysilicon in a Trichlorosilane and Hydrogen System
Journal of the Electrochemical Society
Surfaces
Condensed Matter Physics
Optical
Electrochemistry
Sustainability
Materials Chemistry
Magnetic Materials
Renewable Energy
Films
Coatings
Electronic
the Environment
Analysis of Heat Transfer in a Chemical Vapor Deposition Reactor: An Eigenfunction Expansion Solution Approach
International Journal of Heat and Fluid Flow
Transfer Processes
Fluid Flow
Condensed Matter Physics
Mechanical Engineering
An Asymptotic Analysis of a Queuing Model for a Call Center
International Journal of Business Data Communications and Networking
Computer Networks
Management Information Systems
Communications
Chemical Vapor Deposition of Tungsten Oxide
Applied Organometallic Chemistry
Inorganic Chemistry
Chemistry
Plasmon-Assisted Chemical Vapor Deposition
A High Temperature, Plasma-Assisted Chemical Vapor Deposition System
Low Pressure Chemical Vapor Deposition of A-Si:H From Disilane
Optimization of Deposition Parameters for Thin Silicon Films on Flexible Substrates in a Hot-Wire Chemical Vapor Deposition Reactor
Materials Science Forum
A Homogenization Technique for the Boltzmann Equation for Low Pressure Chemical Vapor Deposition
SIAM Journal on Applied Mathematics
Applied Mathematics
