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Publications by Christoph Hohle
Chemically Amplified Main Chain Scission: New Concept to Reduce Line Edge Roughness and Outgassing.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Related publications
Determination of Optimum Thermalization Distance Based on Trade-Off Relationship Between Resolution, Line Edge Roughness and Sensitivity of Chemically Amplified Extreme Ultraviolet Resists
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Special Section Guest Editorial: Line-Edge Roughness
Journal of Micro/ Nanolithography, MEMS, and MOEMS
Electronic Engineering
Condensed Matter Physics
Mechanical Engineering
Electronic
Molecular Physics,
Nanoscience
Optical
Electrical
Atomic
Magnetic Materials
Nanotechnology
Optics
Fabricating a High-Resolution Mask With Improved Line-Edge Roughness by Using a Nonchemically Amplified Resist and a Postexposure Bake
Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Surfaces
Electronic Engineering
Condensed Matter Physics
Instrumentation
Electronic
Optical
Materials Chemistry
Electrical
Magnetic Materials
Films
Process Chemistry
Coatings
Technology
Outgassing Properties of Chemically Polished Titanium Materials.
Shinku
Analytic Estimation and Minimization of Line Edge Roughness in Electron-Beam Lithography
Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Surfaces
Electronic Engineering
Condensed Matter Physics
Instrumentation
Electronic
Optical
Materials Chemistry
Electrical
Magnetic Materials
Films
Process Chemistry
Coatings
Technology
Electrical Impact of Line-Edge Roughness on Sub-45nm Node Standard Cell
Photochemistry of Imino Sulfonate Compounds and Their Application to Chemically Amplified Resists.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Highly-Sensitive Biosensors With Chemically-Amplified Responses
Electrochemistry
Electrochemistry
The Lithographic Performance and Contamination Resistance of a New Family of Chemically Amplified DUV Photoresists.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
