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Publications by Christopher S Blackman
The Gas-Sensing Properties of WO3−x Thin Films Deposited via the Atmospheric Pressure Chemical Vapour Deposition (APCVD) of WCl6 With Ethanol
Measurement Science and Technology
Instrumentation
Engineering
Applied Mathematics
Related publications
Deposition and Properties of Zn3N2 Thin Films by Atmospheric Pressure Chemical Vapor Deposition
Transactions of the Materials Research Society of Japan
Silicon Carbon Nitride Thin Films Deposited by Pulsed Microwave Plasma Assisted Chemical Vapour Deposition
Journal of Applied Sciences
Ethanol and Hydrogen Gas-Sensing Properties of CuO–CuFe2O4 Nanostructured Thin Films
IEEE Sensors Journal
Electronic Engineering
Electrical
Instrumentation
Compositionally Tunable Ternary Bi2(Se1−xTex)3 and (Bi1−ySby)2Te3 Thin Films via Low Pressure Chemical Vapour Deposition
Journal of Materials Chemistry C
Materials Chemistry
Chemistry
Fe Doped WO3 Thin Films Prepared by Spray Pyrolysis Towards Ethanol Sensing
International Journal of ChemTech Research
Chemistry
Chemical Engineering
Metal-Organic Chemical Vapour Deposition of Lithium Manganese Oxide Thin Films via Single Solid Source Precursor
Materials Science-Poland
Mechanics of Materials
Materials Science
Condensed Matter Physics
Mechanical Engineering
Effect of Sn Doping on Structural Properties of ZnO Thin Films Prepared by Atmospheric Pressure Chemical Vapor Deposition Method
Diyala Journal For Pure Science
Structural and Magnetic Properties of Ultra-Thin Fe Films on Metal-Organic Chemical Vapour Deposited GaN(0001)
Journal of Applied Physics
Astronomy
Physics
Plasma Enhanced Chemical Vapour Deposition of Hydrogenated Amorphous Silicon at Atmospheric Pressure
Plasma Sources Science and Technology
Condensed Matter Physics
