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Publications by Colin A. Scotchford
Oxidation State of a Polyurethane Membrane After Plasma Etching
Conference Papers in Science
Related publications
Feedback Control of Plasma Etching Reactors for Improved Etching Uniformity
Chemical Engineering Science
Applied Mathematics
Chemistry
Chemical Engineering
Manufacturing Engineering
Industrial
Plasma Chemistries for High Density Plasma Etching of SiC
Journal of Electronic Materials
Electronic Engineering
Condensed Matter Physics
Optical
Materials Chemistry
Electrical
Magnetic Materials
Electronic
Criticality of Plasma Membrane Lipids Reflects Activation State of Macrophage Cells
Journal of the Royal Society Interface
Biochemistry
Biophysics
Biomaterials
Biotechnology
Bioengineering
Biomedical Engineering
Surface Chemistry During Plasma Etching of Silicon
Pure and Applied Chemistry
Chemistry
Chemical Engineering
Numerical Simulation of a Single-Wafer Isothermal Plasma Etching Reactor
Journal of the Electrochemical Society
Surfaces
Condensed Matter Physics
Optical
Electrochemistry
Sustainability
Materials Chemistry
Magnetic Materials
Renewable Energy
Films
Coatings
Electronic
the Environment
Monitoring of Polyurethane Dispersions After the Synthesis
Materiali in Tehnologije
Polymers
Alloys
Plastics
Metals
Membrane Raft Association Is a Determinant of Plasma Membrane Localization
Proceedings of the National Academy of Sciences of the United States of America
Multidisciplinary
13C NMR of Polyurethane in the Solid State.
Kobunshi Ronbunshu
Materials Science
Polymers
Plastics
Chemical Engineering
Environmental Science
CO2 Laser-Induced Surface Oxidation and Etching of Si and Si3N4.
Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering
Mechanical Engineering
