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Publications by Constantin Vahlas

Ιn Situ N2-Nh3 Plasma Pre-Treatment of Silicon Substrate Enhances the Initial Growth and Restricts the Substrate Oxidation During Alumina ALD

Journal of Applied Physics
AstronomyPhysics
2019English

Temperature Dependent 4-, 5- And 6-Fold Coordination of Aluminum in MOCVD-Grown Amorphous Alumina Films: From Local Coordination to Material Properties

Advances in Science and Technology
2014English

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