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Publications by D. C. Hays
Plasma Chemistries for High Density Plasma Etching of SiC
Journal of Electronic Materials
Electronic Engineering
Condensed Matter Physics
Optical
Materials Chemistry
Electrical
Magnetic Materials
Electronic
Related publications
Introduction to Plasma Astrophysics Characteristics of Astrophysical Plasma High Density Plasma.
Kakuyūgō kenkyū
Feedback Control of Plasma Etching Reactors for Improved Etching Uniformity
Chemical Engineering Science
Applied Mathematics
Chemistry
Chemical Engineering
Manufacturing Engineering
Industrial
High Density Internal Transport Barriers for Burning Plasma Operation
Plasma Physics and Controlled Fusion
Engineering
Nuclear Energy
Condensed Matter Physics
Advanced Nano-Devices Produced by High-Performance Plasma Etching Processes
Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering
Mechanical Engineering
A Coupled Plasma and Sheath Model for High Density Reactors
IEEE Transactions on Plasma Science
High Energy Physics
Nuclear
Condensed Matter Physics
High Electronegativity Multi-Dipolar Electron Cyclotron Resonance Plasma Source for Etching by Negative Ions
Journal of Applied Physics
Astronomy
Physics
Surface Chemistry During Plasma Etching of Silicon
Pure and Applied Chemistry
Chemistry
Chemical Engineering
Application of High Density Ar Plasma for Optical Thin Films Coating
Journal of the Illuminating Engineering Institute of Japan (Shomei Gakkai Shi)
Electronic Engineering
Electrical
Low Temperature SF6/O2ECR Plasma Etching for Polysilicon Gates
