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Publications by D. M. Tanenbaum

Nanoparticle Deposition in Hydrogenated Amorphous Silicon Films During Rf Plasma Deposition

Applied Physics Letters

English

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Plasma Enhanced Chemical Vapour Deposition of Hydrogenated Amorphous Silicon at Atmospheric Pressure

Plasma Sources Science and Technology

Condensed Matter Physics

English

Plasma Diagnostics of Rf Discharges Used for the Deposition of Hydrogenated Amorphous Carbon Coatings

Journal de Physique III

English

The Effect of Ion-Surface and Ion-Bulk Interactions During Hydrogenated Amorphous Silicon Deposition

Journal of Applied Physics

English

Nanostructure Formation During Amorphous Carbon Films Deposition

Acta Physica Polonica A

English

The Effects of Ion Bombardment During Deposition Upon the Properties of Hydrogenated Amorphous Silicon-Germanium Thin Films and Photovoltaic Devices

English

Hydrogenated Silicon Carbide Thin Films Prepared With High Deposition Rate by Hot Wire Chemical Vapor Deposition Method

Journal of Coatings

English

RF Plasma MOCVD of Y2O3 Thin Films: Effect of RF Self-Bias on the Substrates During Deposition

Applied Surface Science

Condensed Matter Physics

English

Low-Temperature Deposition of Silicon Dioxide Films in High-Density Plasma

Semiconductor Physics, Quantum Electronics and Optoelectronics

Electronic Engineering

Molecular Physics,

Magnetic Materials

English

Kinetic Monte Carlo Simulations of Surface Growth During Plasma Deposition of Silicon Thin Films

Journal of Chemical Physics

Theoretical Chemistry

English