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Publications by Daniel P. Sanders
Integration of Directed Self-Assembly With 193 Nm Lithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
A General Model for Selectivity in Olefin Cross Metathesis
Journal of the American Chemical Society
Biochemistry
Colloid
Catalysis
Chemistry
Surface Chemistry
Related publications
Directed Self Assembly Materials for Semiconductor Lithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Phase-Shift Mask Issues for 193-Nm Lithography
Contact Hole Shrink Process Using Graphoepitaxial Directed Self-Assembly Lithography
Journal of Micro/ Nanolithography, MEMS, and MOEMS
Electronic Engineering
Condensed Matter Physics
Mechanical Engineering
Electronic
Molecular Physics,
Nanoscience
Optical
Electrical
Atomic
Magnetic Materials
Nanotechnology
Optics
A Simulation Study on Defectivity in Directed Self-Assembly Lithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Recent Advancements in 193 Nm Step and Scan Lithography.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Approaching the Numerical Aperture of Water Immersion Lithography at 193-Nm
Hyper High Numerical Aperature Achromatic Interferometer for Immersion Lithography at 193 Nm
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
High-Q Photonic Crystal Nanocavities on 300 Mm SOI Substrate Fabricated With 193 Nm Immersion Lithography
Journal of Lightwave Technology
Optics
Atomic
Molecular Physics,
Low Loss InP Membrane Photonic Integrated Circuits Enabled by 193-Nm Deep UV Lithography
