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Publications by Dheolkyu Bok
The Study on Developer Containing Surfactant for ArF Lithography Process
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Related publications
Chemically Amplified Silicon Containing Resist for ArF Excimer Laser Lithography.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
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Diffusion Kinetic of Vapor-Phase Silylation Process for ArF Lithography.
Journal of Photopolymer Science and Technology
Organic Chemistry
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Alternative Developer Solutions and Processes for EUV and ArFi Lithography
Journal of Photopolymer Science and Technology
Organic Chemistry
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Materials and Process Parameters on ArF Immersion Defectivity Study
Journal of Photopolymer Science and Technology
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High Refractive Index Fluid for Next Generation ArF Immersion Lithography
Journal of Photopolymer Science and Technology
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Successors of ArF Water-Immersion Lithography: EUV Lithography, Multi-E-Beam Maskless Lithography, or Nanoimprint?
Journal of Micro/ Nanolithography, MEMS, and MOEMS
Electronic Engineering
Condensed Matter Physics
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The Need of Top Anti-Reflective Coating Materials for ArF Immersion Lithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
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New Prospect of Successors to ArF Water-Immersion Lithography
Journal of Micro/ Nanolithography, MEMS, and MOEMS
Electronic Engineering
Condensed Matter Physics
Mechanical Engineering
Electronic
Molecular Physics,
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Optical
Electrical
Atomic
Magnetic Materials
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Chemically Amplified Si-Contained Resist Using Silsesquoxane for ArF Lithography (CASUAL) and Its Application to Bi-Layer Resist Process.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
