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Publications by Donald C. Hofer

The Lithographic Performance and Contamination Resistance of a New Family of Chemically Amplified DUV Photoresists.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

193nm Photoresist R&D the Risk & Challenge

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Related publications

Effects of Airborne Molecular Contamination on DUV Photoresists.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Novel Diffusion Analysis in Advanced Chemically Amplified DUV Resists Using Photometric Methods.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Measurements of the Reaction-Diffusion Front of Model Chemically Amplified Photoresists With Varying Photoacid Size

English

Study on Resist Performance of Chemically Amplified Molecular Resists Based on Cyclic Oligomers

Microelectronic Engineering

Electronic Engineering

Condensed Matter Physics

Molecular Physics,

Magnetic Materials

English

Towards a Better Understanding of Positive Chemically Amplified Systems.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Lithographic Lasers With Low Thermal Resistance

Electronics Letters

Electronic Engineering

English

Chemically Amplified Main Chain Scission: New Concept to Reduce Line Edge Roughness and Outgassing.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Highly-Sensitive Biosensors With Chemically-Amplified Responses

Electrochemistry

Electrochemistry

English

The Effects of Polymer Undercoats on the Pattern Profile of Chemically Amplified Resists.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English