Discover open access scientific publications

Search, annotate, share and cite publications

Publications by Eric A. Joseph

Fluorocarbon Assisted Atomic Layer Etching of SiO2 Using Cyclic Ar/C4f8 Plasma

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Condensed Matter Physics

English

Related publications

Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide

Nanoscale Research Letters

Materials Science

Condensed Matter Physics

English

Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Condensed Matter Physics

English

Atomic Layer Etching of Gallium Nitride (0001)

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Condensed Matter Physics

English

Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition

Journal of the Electrochemical Society

Condensed Matter Physics

Electrochemistry

Materials Chemistry

Magnetic Materials

Renewable Energy

the Environment

English

Modeling of Implantation and Mixing Damage During Etching of SiO2 Over Si in Fluorocarbon Plasmas

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Condensed Matter Physics

English

Competition Between Al2O3 Atomic Layer Etching and AlF3 Atomic Layer Deposition Using Sequential Exposures of Trimethylaluminum and Hydrogen Fluoride

Journal of Chemical Physics

Theoretical Chemistry

English

Study on Deposition of Al2O3 Films by Plasma-Assisted Atomic Layer With Different Plasma Sources

Plasma Science and Technology

Condensed Matter Physics

English

In Situ Reaction Mechanism Studies of Plasma-Assisted Atomic Layer Deposition of Al2O3

Applied Physics Letters

English

Atomic Layer Deposition of InN Using Trimethylindium and Ammonia Plasma

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Condensed Matter Physics

English