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Publications by Franco Cerrina

Guest Editorial: Extreme Ultraviolet Interference Lithography

Journal of Micro/ Nanolithography, MEMS, and MOEMS

Electronic Engineering

Condensed Matter Physics

Mechanical Engineering

Molecular Physics,

Magnetic Materials

English

Related publications

Pushing Extreme Ultraviolet Lithography Development Beyond 22 Nm Half Pitch

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures

English

Intense Plasma Discharge Source at 135 Nm for Extreme-Ultraviolet Lithography

Molecular Physics,

English

Power Scaling of an Extreme Ultraviolet Light Source for Future Lithography

Applied Physics Letters

English

Experimental Investigation of Beryllium-Based Multilayer Coatings for Extreme Ultraviolet Lithography

English

Enhancing Extreme Ultraviolet Photons Emission in Laser Produced Plasmas for Advanced Lithography

Physics of Plasmas

Condensed Matter Physics

English

Computational Study of Pattern Formation for Chemically Amplified Resists in Extreme Ultraviolet Lithography

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Interferometric Lithography With an Amplitude Division Interferometer and a Desktop Extreme Ultraviolet Laser

Journal of the Optical Society of America B: Optical Physics

Nonlinear Physics

Molecular Physics,

English

Development of Compact Extreme Ultraviolet Interferometry for On-Line Test of Lithography Cameras

English

Ptychography as a Wavefront Sensor for High-Numerical Aperture Extreme Ultraviolet Lithography: Analysis and Limitations

Optical Engineering

Molecular Physics,

English