Amanote Research
Register
Sign In
Discover open access scientific publications
Search, annotate, share and cite publications
Publications by Fred L. Terry, Jr.
In-Situ UV Absorption CF 2 Sensor for Reactive Ion Etch Process Control
Related publications
In Situ Reactive Fabrication of ZrC–SiC Coating on Cf/ZrC–SiC Composite
Journal of Asian Ceramic Societies
Composites
Ceramics
Etch Characteristics of Nickel Oxide Thin Films Using Inductively Coupled Plasma Reactive Ion Etching
Electrochemical and Solid-State Letters
High Etch Rate and Smooth Morphology Using a Novel Chemistry in Reactive Ion Etching of GaN
Electrochemical and Solid-State Letters
Wafer Surface Charge Reversal as a Method of Simplifying Nanosphere Lithography for Reactive Ion Etch Texturing of Solar Cells
Advances in OptoElectronics
Electronic Engineering
Optical
Electrical
Magnetic Materials
Electronic
Reduction of Critical Dimension Difference in Litho-Etch-Litho- Etch Double Patterning Process
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Real-Time, in Situ Sensor for Control of Ammonia Slip in SCR Installations
A Plasma Cloud Charge Sensor for Pulse Keyhole Process Control
Measurement Science and Technology
Instrumentation
Engineering
Applied Mathematics
Absorption Line Indices in the UV
Astronomy and Astrophysics
Astrophysics
Astronomy
Planetary Science
Space
Dry Etch Characteristics of Silylated Deep UV Resists in Novel Plasma Configurations.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
