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Publications by G. J. Grzybowski
Process for Growth of Group-Iv Alloys Containing Tin by Remote Plasma Enhanced Chemical Vapor Deposition
Frontiers in Materials
Materials Science
Related publications
Atomically Controlled Processing for Group IV Semiconductors by Chemical Vapor Deposition
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
Engineering
Astronomy
Physics
Chemical Vapor Deposition of Tin Sulfide From Diorganotin(IV) Dixanthates
Journal of Materials Science
Mechanics of Materials
Materials Science
Mechanical Engineering
Physical and Electrical Properties of Noncrystalline Al2O3 Prepared by Remote Plasma Enhanced Chemical Vapor Deposition
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surfaces
Films
Interfaces
Condensed Matter Physics
Coatings
Growth of Carbon Nanotubes by Microwave Plasma-Enhanced Chemical Vapor Deposition at Low Temperature
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surfaces
Films
Interfaces
Condensed Matter Physics
Coatings
Deposition of Titanium Nitride on Porous Glass by Plasma-Enhanced Chemical Vapor Deposition.
SHINKU
Growth of Aligned Carbon Nanotubes on Carbon Microfibers by Dc Plasma-Enhanced Chemical Vapor Deposition
Applied Physics Letters
Astronomy
Physics
Preparation of Titanium Nitride Films by Plasma-Enhanced Chemical Vapor Deposition (II)
SHINKU
Ellipsometric Monitoring of First Stages of Graphene Growth in Plasma-Enhanced Chemical Vapor Deposition
Journal of the Vacuum Society of Japan
Surfaces
Instrumentation
Interfaces
Spectroscopy
Materials Science
Gallium Assisted Plasma Enhanced Chemical Vapor Deposition of Silicon Nanowires
Nanotechnology
Mechanics of Materials
Electronic Engineering
Mechanical Engineering
Materials Science
Nanoscience
Electrical
Bioengineering
Nanotechnology
Chemistry
