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Publications by Gerald Lucovsky

H Loss Mechanism During Anneal of Silicon Nitride: Chemical Dissociation

Journal of Applied Physics
AstronomyPhysics
2000English

Physical and Electrical Properties of Noncrystalline Al2O3 Prepared by Remote Plasma Enhanced Chemical Vapor Deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
SurfacesFilmsInterfacesCondensed Matter PhysicsCoatings
2001English

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