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Publications by Gerald Lucovsky
H Loss Mechanism During Anneal of Silicon Nitride: Chemical Dissociation
Journal of Applied Physics
Astronomy
Physics
Physical and Electrical Properties of Noncrystalline Al2O3 Prepared by Remote Plasma Enhanced Chemical Vapor Deposition
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surfaces
Films
Interfaces
Condensed Matter Physics
Coatings