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Publications by Gerrit M. W. Kroesen
Reactive Ion Etching of SiGe Alloys Using HBr
Applied Physics Letters
Astronomy
Physics
Related publications
Reactive Ion Etching Characteristics of Permalloy Thin Films
Journal of the Magnetics Society of Japan
Etch Characteristics of Nickel Oxide Thin Films Using Inductively Coupled Plasma Reactive Ion Etching
Electrochemical and Solid-State Letters
Magneto-Optical Disk Substrate Prepared by Reactive Ion Etching.
SHINKU
Reactive Ion Etching of Quartz and Pyrex for Microelectronic Applications
Journal of Applied Physics
Astronomy
Physics
Nano-Pattern Profile Control Technology Using Reactive Ion Etching for 100 GB Optical Disc Mastering
Reactive Ion Etching: Optimized Diamond Membrane Fabrication for Transmission Electron Microscopy
Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Surfaces
Electronic Engineering
Condensed Matter Physics
Instrumentation
Electronic
Optical
Materials Chemistry
Electrical
Magnetic Materials
Films
Process Chemistry
Coatings
Technology
High Etch Rate and Smooth Morphology Using a Novel Chemistry in Reactive Ion Etching of GaN
Electrochemical and Solid-State Letters
Reactive Ion Etching in the Gaseous Electronics Conference Rf Reference Cell
Journal of Research of the National Institute of Standards and Technology
Engineering
Reactive Ion Etching of PECVD Silicon Dioxide (SiO2) Layer for MEMS Application
