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Publications by Guillaume von Gastrow
Effect of Ozone Concentration on Silicon Surface Passivation by Atomic Layer Deposited Al 2 O 3
Applied Surface Science
Surfaces
Astronomy
Condensed Matter Physics
Interfaces
Films
Coatings
Chemistry
Physics
Effect of Substrate Pretreatments on the Atomic Layer Deposited Al2O3 Passivation Quality
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surfaces
Films
Interfaces
Condensed Matter Physics
Coatings
Related publications
Silicon Surface Passivation by Atomic Layer Deposited Al2O3
Journal of Applied Physics
Astronomy
Physics
FT-IR and TPD Analysis of Ozone-Based Atomic Layer Deposited AlOx Passivation Films for Crystalline Silicon Solar Cells
Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al[sub 2]O[sub 3] Thin Films
Journal of the Electrochemical Society
Surfaces
Condensed Matter Physics
Optical
Electrochemistry
Sustainability
Materials Chemistry
Magnetic Materials
Renewable Energy
Films
Coatings
Electronic
the Environment
Surface Passivation of Black Silicon by Thermal ALD Deposited Aluminum Oxide
Excellent Silicon Surface Passivation Achieved by Industrial Inductively Coupled Plasma Deposited Hydrogenated Intrinsic Amorphous Silicon Suboxide
International Journal of Photoenergy
Materials Science
Renewable Energy
Molecular Physics,
Sustainability
Atomic
Chemistry
Optics
the Environment
Atomic Layer Deposition: Atomic Layer Deposition of Al 2 O 3 Directly on 2D Materials for High‐Performance Electronics (Adv. Mater. Interfaces 10/2019)
Advanced Materials Interfaces
Mechanics of Materials
Mechanical Engineering
Enhanced Light Stability of InGaZnO Thin-Film Transistors by Atomic-Layer-Deposited Y2O3 With Ozone
Silicon Nanowire Heterojunction Solar Cells With an Al2O3 Passivation Film Fabricated by Atomic Layer Deposition
Nanoscale Research Letters
Materials Science
Nanotechnology
Condensed Matter Physics
Nanoscience
