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Publications by Haruhiko Ito
Fabrication of A-CNx Films by RF-plasma Decomposition of BrCN
Transactions of the Materials Research Society of Japan
Analysis of Dissociative Excitation Reaction of Tetramethylsilane With Microwave Discharge Flow of Ar
Transactions of the Materials Research Society of Japan
Dissociative Excitation Process of BrCN in the ECR Plasmas of Rare Gases
Transactions of the Materials Research Society of Japan
Related publications
Preparation of Hard CNx Films by Reactive Sputtering.
SHINKU
Carbon Nitride Thin Films Prepared by a Capacitively Coupled RF Plasma Jet
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
High Energy Physics
Instrumentation
Nuclear
A Deposition Model of Ultra Thin Plasma Polymerized Acethylene Films by Pulsed RF Discharge
IEEJ Transactions on Fundamentals and Materials
Electronic Engineering
Electrical
Characteristics of Diamond-Like Carbon Thin Films Prepared by a RF Plasma Pulse Deposition Method
TANSO
RF Plasma MOCVD of Y2O3 Thin Films: Effect of RF Self-Bias on the Substrates During Deposition
Applied Surface Science
Surfaces
Astronomy
Condensed Matter Physics
Interfaces
Films
Coatings
Chemistry
Physics
Fabrication of SiO2/Ge MIS Structures by Plasma Oxidation of Ultrathin Si Films Grown on Ge
Nanoparticle Deposition in Hydrogenated Amorphous Silicon Films During Rf Plasma Deposition
Applied Physics Letters
Astronomy
Physics
Cr-N Films Prepared by RF Magnetron Sputtering.
SHINKU
Low-Temperature Fabrication of Layered Self-Organized Ge Clusters by RF-sputtering
Nanoscale Research Letters
Materials Science
Nanotechnology
Condensed Matter Physics
Nanoscience
