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Publications by Helmut Lenz
Image Reversal Resist for G-Line Exposure: Chemistry and Lithographic Evaluation.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Related publications
Electrical Metrics for Lithographic Line-End Tapering
Ultra-Precision Engineering in Lithographic Exposure Equipment for the Semiconductor Industry
Philosophical Transactions of the Royal Society A: Mathematical, Physical and Engineering Sciences
Mathematics
Engineering
Astronomy
Physics
Evaluation of Resist Capability for EUV Lithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
193 Nm Resist Line Collapse Study by Modifying the Resist Polymer and Process Conditions With Utilizing FIRM Process
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Evaluation of Image Quality and Radiation Exposure on Degeneration of II
Nippon Hoshasen Gijutsu Gakkai zasshi
Medicine
Dry-Developable Electron-Beam Resist. Synthesis and Resist Characteristic Evaluation of Amino-Ended Poly(.ALPHA.-Methylstyrene).
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
CHEMISTRY: Kept in Line
Science
Multidisciplinary
Philosophy of Science
History
Temperature Rise of the Mask-Resist Assembly During LIGA Exposure.
Exposure Evaluation Guidance for REACH
