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Publications by Henry Herbol
Secondary Electrons in EUV Lithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Related publications
EUV Lithography
Synchrotron Radiation News
High Energy Physics
Nuclear
Optics
Atomic
Molecular Physics,
Progress in EUV Resists Towards High-Na EUV Lithography
Pattern Replication in EUV Interference Lithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Approach to EUV Lithography Simulation
EUV Lithography and Exposure Tool.
Journal of Plasma and Fusion Research
Overcoming Mask Blank Defects in EUV Lithography
SPIE Newsroom
Effects of Fast Secondary Electrons to Low-Voltage Electron Beam Lithography
Journal of Micro/ Nanolithography, MEMS, and MOEMS
Electronic Engineering
Condensed Matter Physics
Mechanical Engineering
Electronic
Molecular Physics,
Nanoscience
Optical
Electrical
Atomic
Magnetic Materials
Nanotechnology
Optics
EUV Light Sources for Next-Gen Lithography
Optics and Photonics News
Electronic Engineering
Condensed Matter Physics
Electronic
Molecular Physics,
Optical
Electrical
Atomic
Magnetic Materials
Optics
Progress Overview of EUV Resists Status Towards High-Na EUV Lithography
