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Publications by Hiroki Akasaka

Fabrication of A-CNx Films by RF-plasma Decomposition of BrCN

Transactions of the Materials Research Society of Japan

English

Isotopic Influence on Amorphous Carbon Films

Transactions of the Materials Research Society of Japan

English

Related publications

Preparation of Hard CNx Films by Reactive Sputtering.

English

Carbon Nitride Thin Films Prepared by a Capacitively Coupled RF Plasma Jet

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

High Energy Physics

Instrumentation

English

A Deposition Model of Ultra Thin Plasma Polymerized Acethylene Films by Pulsed RF Discharge

IEEJ Transactions on Fundamentals and Materials

Electronic Engineering

English

Characteristics of Diamond-Like Carbon Thin Films Prepared by a RF Plasma Pulse Deposition Method

English

RF Plasma MOCVD of Y2O3 Thin Films: Effect of RF Self-Bias on the Substrates During Deposition

Applied Surface Science

Condensed Matter Physics

English

Fabrication of SiO2/Ge MIS Structures by Plasma Oxidation of Ultrathin Si Films Grown on Ge

English

Nanoparticle Deposition in Hydrogenated Amorphous Silicon Films During Rf Plasma Deposition

Applied Physics Letters

English

Cr-N Films Prepared by RF Magnetron Sputtering.

English

Low-Temperature Fabrication of Layered Self-Organized Ge Clusters by RF-sputtering

Nanoscale Research Letters

Materials Science

Condensed Matter Physics

English