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Publications by Hiroshi KISHIKI
Studies on Application of the Substituted Poly(acetylene) to UV Photoresist. II. Photoresist Characteristics of the Sensitized Poly[1-(Trimethylsilyl)-1-Propyne].
Kobunshi Ronbunshu
Materials Science
Polymers
Plastics
Chemical Engineering
Environmental Science
Related publications
Gas Permeability and Permselectivity in Plasma Treated Poly (1-Trimethylsilyl-1-Propyne) Membrane.
membrane
Effects of Aging on Molecular Motion of Poly(1-Trimethylsilyl-1-Propyne) Membranes Synthesized Using Vanous Catalysts
Polymer Journal
Polymers
Materials Chemistry
Plastics
Erratum to : Permeation of Gases in Poly [1- (Trimethylsiiyl) -1-Propyne]
Kobunshi Ronbunshu
Materials Science
Polymers
Plastics
Chemical Engineering
Environmental Science
Micropatterning of Poly(dimethylsiloxane) Using a Photoresist Lift-Off Technique for Selective Electrical Insulation of Microelectrode Arrays
Journal of Micromechanics and Microengineering
Mechanics of Materials
Electronic Engineering
Mechanical Engineering
Nanoscience
Optical
Electrical
Magnetic Materials
Nanotechnology
Electronic
Trends of Dry Film Photoresist
Circuit Technology
The Fundamental Properties and Thermal Decomposition Characteristics of Poly-4-Methylpentene-1.
Kobunshi Ronbunshu
Materials Science
Polymers
Plastics
Chemical Engineering
Environmental Science
193nm Photoresist R&D the Risk & Challenge
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Applications of High-Ortho Novolak Resins to Photoresist Materials.
Kobunshi Ronbunshu
Materials Science
Polymers
Plastics
Chemical Engineering
Environmental Science
Effect of Microbubbles on Ozonized Water for Photoresist Removal
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
