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Publications by Hiroshi Kanoh
Top-Gate Amorphous-Silicon Thin-Film Transistors Produced by CVD Method
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
Engineering
Astronomy
Physics
Related publications
Thin-Film Transistors: Top-Split-Gate Ambipolar Organic Thin-Film Transistors (Adv. Electron. Mater. 5/2018)
Advanced Electronic Materials
Optical
Electronic
Magnetic Materials
Integration of Amorphous and Polycrystalline Silicon Thin-Film Transistors Through Selective Crystallization of Amorphous Silicon
Applied Physics Letters
Astronomy
Physics
Characteristics of Polycrystalline Silicon Thin-Film Transistors With Thin Oxide/Nitride Gate Structures
Optical Engineering
Engineering
Optics
Atomic
Molecular Physics,
Electronic Transport in Low Temperature Nanocrystalline Silicon Thin-Film Transistors Obtained by Hot-Wire CVD
Journal of Non-Crystalline Solids
Condensed Matter Physics
Materials Chemistry
Optical
Magnetic Materials
Composites
Electronic
Ceramics
Stability Improvement of Deuterated Amorphous Silicon Thin-Film Transistors Characterized by Modified Schottky-Contact Gated-Four-Probe Method
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
Nitrocellulose-Based Collodion Gate Insulator for Amorphous Indium Zinc Gallium Oxide Thin-Film Transistors
Journal of Information Display
Electronic Engineering
Electrical
Materials Science
Positive Charge Trapping Phenomenon in N-Channel Thin-Film Transistors With Amorphous Alumina Gate Insulators
Journal of Applied Physics
Astronomy
Physics
In-Plane-Gate Flexible Single-Crystalline Silicon Thin-Film Transistors With High-K Gate Dielectrics on Plastic Substrates
AIP Advances
Nanotechnology
Astronomy
Physics
Nanoscience
Comparison of Different Processes in the Fabrication of Crystallized Amorphous Silicon Thin Film Transistors